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University of the Ryukyus Repository >
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Bulletin of the Faculty of Engineering, University of the Ryukyus >
No. 58 (1999/09) >
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| Title | : | a-C:H薄膜のプラズマ処理による構造変化 |
| Title alternative | : | Structural Changes of Hydrogenated Amorphous Carbon Thin Films by Plasma Treatment |
| Authors | : | 勢理客, 勝則
山下, 秀和
比嘉, 晃
渡久地, 實 |
| Authors alternative | : | Serikyaku, Katsunori
Yamashita, Hidekazu
Higa, Akira
Toguchi, Minoru |
| Issue Date | : | Sep-1999 |
| Abstract | : | This paper is desaibed about structural changes of hydrogenated amorphous carbon films (a-C:H) exposed by inductively coupled hydrogen plasma The a-C:H films were prepared by magnetron sputtering using VHF plasma. Structure and optical gap of the plasma exposed films were investigated by infrared (IR) absorption and UV/Visual (VIS) absorption. From IR measurements, it is found that hydrogen concentration in the films decreased with increasing exposed time. The number of sp^3-CH_3 and sp^2-CH bonds in the films decreased as compared with sp^3-CH, sp^3-CH_2 in the films by hydrogen plasma treatment. The optical gap decreased with the bonding hydrogen concentration. |
| Type Local | : | 紀要論文 |
| ISSN | : | 0389-102X |
| Publisher | : | 琉球大学工学部 |
| URI | : | http://hdl.handle.net/20.500.12000/14427 |
| Citation | : | 琉球大学工学部紀要 no.58 p.99 -103 |
| Appears in Collections | : | No. 58 (1999/09)
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Files in This Item:
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| No58p099.pdf | | 457Kb | Adobe PDF | View/Open |
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