HOME    About this site    mypage    Japanese    library    university    Feedback

University of the Ryukyus Repository >
Faculty of Engineering >
Bulletin >
Bulletin of the Faculty of Engineering, University of the Ryukyus >
No. 58 (1999/09) >

Title :a-C:H薄膜のプラズマ処理による構造変化
Title alternative :Structural Changes of Hydrogenated Amorphous Carbon Thin Films by Plasma Treatment
Authors :勢理客, 勝則
山下, 秀和
比嘉, 晃
渡久地, 實
Authors alternative :Serikyaku, Katsunori
Yamashita, Hidekazu
Higa, Akira
Toguchi, Minoru
Issue Date :Sep-1999
Abstract :This paper is desaibed about structural changes of hydrogenated amorphous carbon films (a-C:H) exposed by inductively coupled hydrogen plasma The a-C:H films were prepared by magnetron sputtering using VHF plasma. Structure and optical gap of the plasma exposed films were investigated by infrared (IR) absorption and UV/Visual (VIS) absorption. From IR measurements, it is found that hydrogen concentration in the films decreased with increasing exposed time. The number of sp^3-CH_3 and sp^2-CH bonds in the films decreased as compared with sp^3-CH, sp^3-CH_2 in the films by hydrogen plasma treatment. The optical gap decreased with the bonding hydrogen concentration.
Type Local :紀要論文
ISSN :0389-102X
Publisher :琉球大学工学部
URI :http://hdl.handle.net/20.500.12000/14427
Citation :琉球大学工学部紀要 no.58 p.99 -103
Appears in Collections:No. 58 (1999/09)

Files in This Item:

File Description SizeFormat
No58p099.pdf457KbAdobe PDFView/Open