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No.31 (1987/11) >

Title :Ni蒸着膜における内部応力の入射角依存性
Title alternative :Effects of Oblique-Incidence on Internal Stress in Evaporated Ni Films
Authors :新里, 祐宏
Authors alternative :Shinzato, Sukehiro
Issue Date :Nov-1987
Abstract :The internal stress in vapour-deposited Ni films has been studied as a function of the incidence angle of the evaprant. The main findings are as follows: 1. The internal stress had a constant value for thickness between 0.1 and 0.6μm. 2. The total stress decresed with increasing the incidence angle and the decreasing rate of the total stress had the maximum value at the incidence angle of 45°. 3. The stress anisotropy increased with the increase of the incidence angle. 4. The total stress tended to decrease with increasing the deposition rate for all incidence angles.
Type Local :紀要論文
ISSN :0386-5746
Publisher :琉球大学教育学部
URI :http://hdl.handle.net/20.500.12000/2123
Citation :琉球大学教育学部紀要 第一部・第二部 no.31 p.343 -347
Appears in Collections:No.31 (1987/11)

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