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No.31 (1987/11) >
|Title alternative ||:||Effects of Oblique-Incidence on Internal Stress in Evaporated Ni Films|
|Authors ||:||新里, 祐宏|
|Authors alternative ||:||Shinzato, Sukehiro|
|Issue Date ||:||Nov-1987 |
|Abstract ||:||The internal stress in vapour-deposited Ni films has been studied as a function of the incidence angle of the evaprant. The main findings are as follows:
1. The internal stress had a constant value for thickness between 0.1 and 0.6μm.
2. The total stress decresed with increasing the incidence angle and the decreasing rate of the total stress had the maximum value at the incidence angle of 45°.
3. The stress anisotropy increased with the increase of the incidence angle.
4. The total stress tended to decrease with increasing the deposition rate for all incidence angles.|
|Type Local ||:||紀要論文|
|Citation ||:||琉球大学教育学部紀要 第一部・第二部 no.31 p.343 -347|
|Appears in Collections||:||No.31 (1987/11)|
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