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Title :Schwoebel effect and dynamic scaling behavior in nickel film growth by electrodeposition
Authors :Saitou, Masatoshi
Chinen, T
Odo, Y
Issue Date :18-Jul-1999
Abstract :Two kinds of growth rate of nickel films prepared by electrodeposition were measured by use of columnar photoresists formed on indium-tin oxide (ITO) glass plates. The ratio of the mean growth rate at the edge to that of the nickel layer was 1.5, which indicates direct evidence for the Schwoebel effect [R.L. Schwoebel, J. Appl. Phys. 40 (1969) 614]; i.e., the presence of anisotropy between the up and down step incorporation probabilities of adatoms. The growth exponent of 0.3 was obtained from atomic force microscopy (AFM) images of the nickel film surface. This suggests that the nickel growth by electrodeposition has a dynamic scaling property.
URL :http://www.sciencedirect.com/science/journal/02578972
Type Local :雑誌掲載論文
ISSN :0257-8972
Publisher :Elsevier Science S.A.
URI :http://hdl.handle.net/20.500.12000/391
Citation :Surface & Coatings Technology Vol.115 no.2-3 p.282 -284
Appears in Collections:Peer-reviewed Journal Articles (Faculty of Engineering)

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