|
|
|
Items for Author "斉藤, 正敏"
|
Return to Browse by Author
|
|
|
Sorting by Title |
Sort by Date
|
| Title | Authors |
Date of Issue |
|---|
| Amorphous structures and kinetics of phosphorous incorporation in electrodeposited Ni-P thin films | Saitou, Masatoshi; Okudaira, Y; Oshikawa, W; 斉藤, 正敏 | Mar-2003 |
| Kinetic electrode reactions in silver electrodeposition using a multipulse current measurement | Saitou, Masatoshi; 斉藤, 正敏 | 2005 |
| Macro internal structures of porous Ni-P films electrodeposited under galvanostatic conditions | Saitou, Masatoshi; Okudaira, Y; 斉藤, 正敏 | 2004 |
| A study on transient changes of surface morphologies in Ag and Sb coelectrodeposition | Saitou, Masatoshi; Fukuoka, Y; 斉藤, 正敏 | 2004 |
| Surface growth of Ni thin films electrodeposited on Ni(100) surfaces | Saitou, Masatoshi; Hamaguchi, K; Oshikawa, W; 斉藤, 正敏 | Mar-2003 |
| Surface roughening in the growth of direct current or pulse current electrodeposited nickel thin films | Saitou, Masatoshi; Oshikawa, W; Mori, M; Makabe, A; 斉藤, 正敏 | Dec-2001 |
| アノード溶解したニッケル薄膜の表面フラクタル次元 | 真壁, 朝宏; 押川, 渡; 斉藤, 正敏; Makabe, Asahiro; Oshikawa, Wataru; Saitou, Masatoshi | 25-Dec-2001 |
| 動的スケーリング理論を用いたAFMによる電気めっき薄膜の成長機構に関する研究 | 斉藤, 正敏; 押川, 渡; Saitou, Masatoshi; Oshikawa, Wataru | May-2003 |
| 溶液成長に於ける溶質場の安定性解析 | 斉藤, 正敏; 押川, 渡; 糸村, 昌祐; Saitou, Masatoshi; Oshikawa, Wataru; Intomura, Shousuke | 25-Jan-1998 |
| 電荷移動反応を伴う電析による薄膜形成過程に関する研究 | 斉藤, 正敏; 押川, 渡; Saitou, Masatoshi; Oshikawa, Wataru | Mar-2005 |
|
|
Showing 10 items.
|
|
|
